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Please use this identifier to cite or link to this item: http://publications.jrc.ec.europa.eu/repository/handle/111111111/11370

Title: Accurate RBS Measurement of Ion Implant Doses in Silicon
Authors: BOUDREAULT G.
JEYNES C.
WENDLER E.
NEJIM A.
WEBB R. p.
WAETJEN Uwe
Citation: Surface and Interface Analysis vol. 33 p. 478-486
Publisher: John Wiley and Sons
Publication Year: 2002
JRC Publication N°: JRC22685
URI: http://publications.jrc.ec.europa.eu/repository/handle/111111111/11370
Type: Articles in Journals
Appears in Collections:Institute for Reference Materials and Measurements

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