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|Title:||Calibration of a Microlithographic Fabrication Process Using Non-Destructive Testing and Rigorous Electromagnetic Theory|
|Authors:||HEISSMEER M.; SHERIDAN John; SCHWIDER J.|
|Citation:||Optik vol. 103 no. 1 p. 12-18|
|Type:||Articles in periodicals and books|
|Abstract:||Comparison of rigorous electromagnetic calculations and measurements of grating diffraction efficiences are applied to estimate the profile of surface relief gratings. The depth of the gratings is estimated using a Linnik interferometer. Information regarding the grating duty cycle (filling factor) and edge slope can then be extracted. The inverse scatter process is inexpensive, non-destructive, and easy to carry out and its accuracy is estimated. The results are applied to calibrate a manufacturing process involving writing with a laser-beam-writing system and etching using reactive ion etching. It is shown that a combination of TE and TM polarisation measurements and calculations can be used to extract a great deal of accurate metrological information.|
|JRC Institute:||Joint Research Centre Historical Collection|
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