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|Title:||Crystallite Size Distributions and Lattice Defects in R.F. Sputtered Nanograin TiO2 and SnO2 Films.|
|Citation:||Nanostructured Materials vol. 10 p. 357-363|
|Type:||Articles in Journals|
|Abstract:||Transmission electron microscopy is used to determine the grain size distribution and examine planar defect structures in nanocrystalline TiO2 and SnO2 films deposited by r.f. sputtering. The observed defects consist mainly of fine twin lamellae and crystallographic shear planes with a (011) habit plane. These results are discussed in relation of those of previous investigations of stoichiometric and non-stoichiometric thin films and nanocrystallyne powders prepared by the inert gas condensation technique. The influence of departures from stoichiometry on the formation of CSP and their role as sinks for point defects (oxygen vacancies) is considered.|
|JRC Institute:||Joint Research Centre Historical Collection|
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