Title: Certification of Antinomy Implanted in Silicon Wafer with a Silicon Dioxide Diffusion Barrier
Authors: ECKER K.h.WAETJEN UweBERGER A.GROETZSCHEL RainerPERSSON LeifPRITZKOW W.RADTKE M.RIEBE G.
Publication Year: 2001
JRC Publication N°: JRC22664
Other Identifiers: EUR 20125 EN
URI: http://publications.jrc.ec.europa.eu/repository/handle/JRC22664
Type: EUR - Scientific and Technical Research Reports
Abstract: Abstract not available
JRC Institute:Institute for Reference Materials and Measurements

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