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|Title:||Experimental Study of Effect of Low-Pressure O2:H2 Microwave Discharge on Protein Films|
|Authors:||CECCONE GIACOMO; GILLILAND DOUGLAS; KYLIAN Ondrej; WESTERMEIER Michael|
|Citation:||CZECHOSLOVAK JOURNAL OF PHYSICS vol. 56 no. B p. B672-677|
|Publisher:||INST PHYSICS ACAD SCI CZECH REPUBLIC|
|Type:||Articles in periodicals and books|
|Abstract:||Effect of low-pressure O2:H2 (50:50) microwave discharge on the Bovine Serum Albumine (BSA) deposited on silicon wafers has been investigated. XPS and ToF-SIMS analysis of untreated and treated samples showed significant chemical changes of the deposited protein film occurring during its plasma treatment as well as its progressive removal from the silicon substrate. According to FT-IR analysis it has been found that the chemical changes induced by plasma do not affect bulk properties of protein, namely its secondary structure.|
|JRC Institute:||Institute for Health and Consumer Protection|
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