Title: Deposition of Thick Cubic Boron Nitride Films - Mechanisms and Concepts
Authors: KULISCH WilhelmFREUDENSTEIN Regine
Citation: THIN SOLID FILMS vol. 516 no. 2-4 p. 216-222
Publisher: ELSEVIER SCIENCE SA
Publication Year: 2007
JRC Publication N°: JRC42249
ISSN: 0040-6090
URI: http://publications.jrc.ec.europa.eu/repository/handle/JRC42249
DOI: 10.1016/j.tsf.2007.06.073
Type: Articles in Journals
Abstract: The state of the art concerning the deposition of thick, well-adherent cubic boron nitride films for tribological applications and protective coatings is critically reviewed. It is shown that a great deal of the processes developed up to now for the deposition of thick c-BN films - although they must be considered as major breakthroughs towards the development of a c-BN technology - is not compatible (in terms of substrates, process conditions, etc.) with the requirements of such applications. It is shown further that the peculiarities of c-BN film growth, namely the so-called nucleation sequence and the strong ion bombardment necessary to nucleate and grow c-BN, present serious challenges on the way towards thick c-BN films. The three most important problems, the high stress of the films, their poor adhesion, and their poor stability are addressed, and possible measures to solve them are discussed. Finally, a route is proposed that may lead to the deposition of thick, well-adherent c-BN films.
JRC Institute:Institute for Health and Consumer Protection

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