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|Title:||Deposition of Thick Cubic Boron Nitride Films - Mechanisms and Concepts|
|Authors:||KULISCH Wilhelm; FREUDENSTEIN Regine|
|Citation:||THIN SOLID FILMS vol. 516 no. 2-4 p. 216-222|
|Publisher:||ELSEVIER SCIENCE SA|
|JRC Publication N°:||JRC42249|
|Type:||Articles in Journals|
|Abstract:||The state of the art concerning the deposition of thick, well-adherent cubic boron nitride films for tribological applications and protective coatings is critically reviewed. It is shown that a great deal of the processes developed up to now for the deposition of thick c-BN films - although they must be considered as major breakthroughs towards the development of a c-BN technology - is not compatible (in terms of substrates, process conditions, etc.) with the requirements of such applications. It is shown further that the peculiarities of c-BN film growth, namely the so-called nucleation sequence and the strong ion bombardment necessary to nucleate and grow c-BN, present serious challenges on the way towards thick c-BN films. The three most important problems, the high stress of the films, their poor adhesion, and their poor stability are addressed, and possible measures to solve them are discussed. Finally, a route is proposed that may lead to the deposition of thick, well-adherent c-BN films.|
|JRC Institute:||Institute for Health and Consumer Protection|
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