Title: Monitoring Plasma Etching of Biomolecules by Imaging Ellipsometry
Authors: RAUSCHER HubertSTAPELMANN K.KYLIAN OndrejDENIS BenjaminROSSI Francois
Citation: VACUUM vol. 84 no. 1 p. 75-78
Publisher: PERGAMON-ELSEVIER SCIENCE LTD
Publication Year: 2009
JRC N°: JRC47725
ISSN: 0042-207X
URI: http://publications.jrc.ec.europa.eu/repository/handle/JRC47725
DOI: 10.1016/j.vacuum.2009.05.012
Type: Articles in Journals
Abstract: Low-pressure plasma discharges can be applied to remove various biomolecules from surfaces. However, the knowledge on the interaction between plasma and biomolecules and the kinetics of their removal is still rather poor, which is a major limiting factor for the optimization of this type of plasma treatment. This is, among other reasons, because of the restrictions of currently used techniques for the evaluation of the rates of biomolecule removal during plasma treatment. Therefore, an alternative method based on imaging ellipsometry is applied in this article. It is shown in this study that this method allows reliable semiquantitative comparison of the treatment efficiency of plasma discharges sustained in different gas mixtures.
JRC Institute:Institute for Health and Consumer Protection

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