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|Title:||On the Application of Inductively Coupled Plasma Discharges Sustained in Ar/O2/N2 Ternary Mixture for Sterilization and Decontamination of Medical Instruments|
|Authors:||STAPELMANN K.; DENIS Benjamin; ROSSI Francois; KYLIAN O.|
|Citation:||JOURNAL OF PHYSICS D-APPLIED PHYSICS vol. 41 no. 19 p. 192005-1 192005-6|
|Publisher:||IOP PUBLISHING LTD|
|JRC Publication N°:||JRC48914|
|Type:||Articles in Journals|
|Abstract:||Non-equilibrium low pressure-plasma discharges are extensively studied for their high potential in the field of sterilization and decontamination of medical devices. This increased interest in plasma discharges arises from, among other reasons, their capability not only to inactivate bacterial spores but also to eliminate, destroy or remove pathogenic biomolecules and thus to provide a one-step process assuring safety of treated instruments. However, recent studies have shown that optimal conditions leading to inactivation of spores and physical removal of pathogens differ significantly¿the efficiency of spores sterilization is above all dependent on the UV radiation intensity, whereas high etching rates are connected with the presence of the etching agent, typically atomic oxygen. The aim of this contribution is to discuss and demonstrate the feasibility of Ar/N2/O2 low-pressure inductively coupled plasma discharges as an option to provide intense UV radiation while maintaining the high etching rates of biomolecules.|
|JRC Institute:||Institute for Health and Consumer Protection|
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