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|Title:||Characterization of U-based Thin Films - the UFe2+x Case|
|Authors:||KIM-NGAN Nhu-T H; HAVELA L; ADAMSKA A. M.; DANIS S.; PESICKA J; MACL J; ELOIRDI Rachel; HUBER Frank; GOUDER Thomas; BALOGH A.g.|
|Citation:||Journal of Physics - Conference Series vol. 303 p. 012012 (1-8)|
|Publisher:||Institute of Physics (IOP) and IOP Publishing 2010|
|Type:||Articles in periodicals and books|
|Abstract:||We have characterized UFe2+x films prepared by sputter deposition onto fused silica (SiO2) and Si(111) substrates with the film thickness ranging from 75 nm to 900 nm. The X-ray diffraction results showed an amorphous character of the deposited material. Some of the films showed in addition a pattern of highly textured cubic Laves phase. Rutherford Backscattering Spectroscopy with 2 MeV He+ ions has been used to determine the composition, thickness and concentration depth profile of the films. A large ageing affect was observed within 1 month after that the films were exposed to air. Magnetic measurements revealed TC increasing with relative Fe concentration and reaching approx. 450 K in UFe3.0.|
|JRC Institute:||Nuclear Safety and Security|
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