@article{JRC14607,
	address = {},
	year = {1997},
	author = {O'reilly M and Corish J and Fordham RJ},
	abstract = {We report on the oxidation of a dense hot-pressed Si3N4 with a Nd-N-apatite grain-boundary phase. This material was prepared in-house and the results of an oxidation study in the range 1273 K to 1648 K are discussed. The results were compared to those of monolithic Nd-N-apatite and a HIPped Si3N4 with only a nominal amount of Y- and Al-Based intergranular phase.
		},
	title = {A Comparison between the Oxidation Behaviour of Silicon Nitride Hot-Pressed with Neodymium Oxide and a HIPped Silicon Nitride.},
	type = {},
	url = {},
	volume = {},
	number = {},
	journal = {Journal of the Electrochemical Soc.},
	pages = {},
	issn = {},
	publisher = {},
	doi = {}
}