This paper reports on a study of the oxidation kinetics of a hot-pressed 9 wt% Y2O3, Si3N4 over the temperature range 800 to 1200*C. Data obtained clearly show that oxidation kinetics are mostly non-parabolic suggesting that the oxidation mechanism is more complex than simple diffusion. The oxidation kinetics are modelled and the mechanisms discussed.
COSTA OLIVEIRA Fernando;
BAXTER David;
UNGEHEUER Juergen;
1998-11-05
JRC15860
https://publications.jrc.ec.europa.eu/repository/handle/JRC15860,
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