Full metadata record
DC FieldValueLanguage
dc.contributor.authorCOSTA OLIVEIRA Fernandoen_GB
dc.contributor.authorBAXTER Daviden_GB
dc.contributor.authorUNGEHEUER Juergenen_GB
dc.date.accessioned2010-02-25T15:08:04Z-
dc.date.available1998-11-05en_GB
dc.date.available2010-02-25T15:08:04Z-
dc.date.issued1998en_GB
dc.date.submitted1997-12-05en_GB
dc.identifier.citationJournal of the European Ceramics Society vol. 18 no. 16 p. 2307-23112en_GB
dc.identifier.urihttp://publications.jrc.ec.europa.eu/repository/handle/JRC15860-
dc.description.abstractThis paper reports on a study of the oxidation kinetics of a hot-pressed 9 wt% Y2O3, Si3N4 over the temperature range 800 to 1200*C. Data obtained clearly show that oxidation kinetics are mostly non-parabolic suggesting that the oxidation mechanism is more complex than simple diffusion. The oxidation kinetics are modelled and the mechanisms discussed.en_GB
dc.description.sponsorshipJRC.(IAM)-Institute For Advanced Materialsen_GB
dc.format.mediumPrinteden_GB
dc.languageENGen_GB
dc.relation.ispartofseriesJRC15860en_GB
dc.titleModelling of the Oxidation Kinetics of a Yttria-Doped Hot-Pressed Silicon Nitride.en_GB
dc.typeArticles in periodicals and booksen_GB
JRC Directorate:Joint Research Centre Historical Collection

Files in This Item:
There are no files associated with this item.


Items in repository are protected by copyright, with all rights reserved, unless otherwise indicated.