Title: Deposition of BN by Plasma Assisted Physical Deposition by DC Sputtering of a B4C Target. Relation between Plasma Parameters and Film Characteristics.
Authors: ROSSI FrancoisCECCONE Giacomo
Citation: Not available
Publication Year: 1998
JRC N°: JRC16028
URI: http://publications.jrc.ec.europa.eu/repository/handle/JRC16028
Type: Articles in periodicals and books
Abstract: Abstract not available
JRC Directorate:Joint Research Centre Historical Collection

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