Please use this identifier to cite or link to this item:
|Title:||Microstructural Evolution of Allylamine Polymerized Plasma Films|
|Authors:||LEJEUNE Michael; BRETAGNOL FREDERIC; CECCONE GIACOMO; COLPO Pascal; ROSSI FRANCOIS|
|Citation:||SURFACE & COATINGS TECHNOLOGY vol. 200 p. 5902-5907|
|Publisher:||ELSEVIER SCIENCE SA|
|Type:||Articles in periodicals and books|
|Abstract:||The present paper deals with the characterization of plasma polymerized allylamine films. The films were characterized using a large panel of techniques such as Fourier transformation infrared spectroscopy, X-ray photoemission spectroscopy and ellipsometry. The film microstructure was investigated as a function of the deposition power while other process parameters (gas mixture flow, pressure) were kept constant. The microstructure shows a strong dependence on the deposition power. A power transition has been identified outlining two deposition modes in agreement with a growth model developed for carbon nitride thin films. Conditions of deposition closed to this transition provide a film microstructure interesting for absorption and adhesion of biomolecules i.e. high NH2 content, high porosity and high deposition rate.|
|JRC Directorate:||Institute for Health and Consumer Protection Historical Collection|
Files in This Item:
There are no files associated with this item.
Items in repository are protected by copyright, with all rights reserved, unless otherwise indicated.