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Fabrication of Functional Nano-Patterned Surfaces by a Combination of Plasma Processes and Electron-Beam Lithography

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This work presents a method for the fabrication of well defined chemically active nano-patterned surfaces. Electron-beam lithography has been combined with plasma-based processes in order to create sub-micron carboxylic functional areas over a non-bio-adhesive matrix. Characterization of the patterned surface by several surface analysis techniques reveals that this patterning technique is compatible with the plasma polymerization process in order to fabricate chemically active features with lateral size down to 300 nm. Moreover, experiments with a model protein (bovine serum albumin) on the patterned surfaces show preferential adhesion on the active region indicating the ability of this method for the design of biosensing platforms.
2007-06-29
IOP PUBLISHING LTD
JRC37597
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