Title: On the Application of Inductively Coupled Plasma Discharges Sustained in Ar/O2/N2 Ternary Mixture for Sterilization and Decontamination of Medical Instruments
Citation: JOURNAL OF PHYSICS D-APPLIED PHYSICS vol. 41 no. 19 p. 192005-1 192005-6
Publication Year: 2008
JRC N°: JRC48914
ISSN: 0022-3727
URI: http://dx.doi.org/10.1088/0022-3727/41/19/192005
DOI: 10.1088/0022-3727/41/19/192005
Type: Articles in periodicals and books
Abstract: Non-equilibrium low pressure-plasma discharges are extensively studied for their high potential in the field of sterilization and decontamination of medical devices. This increased interest in plasma discharges arises from, among other reasons, their capability not only to inactivate bacterial spores but also to eliminate, destroy or remove pathogenic biomolecules and thus to provide a one-step process assuring safety of treated instruments. However, recent studies have shown that optimal conditions leading to inactivation of spores and physical removal of pathogens differ significantly¿the efficiency of spores sterilization is above all dependent on the UV radiation intensity, whereas high etching rates are connected with the presence of the etching agent, typically atomic oxygen. The aim of this contribution is to discuss and demonstrate the feasibility of Ar/N2/O2 low-pressure inductively coupled plasma discharges as an option to provide intense UV radiation while maintaining the high etching rates of biomolecules.
JRC Directorate:Institute for Health and Consumer Protection Historical Collection

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