Optimized Allylamine Deposition for Improved Pluripotential Cell Culture

Deposition of allylamine (ALL) by plasma enhanced chemical vapor deposition has been optimized on silicon based models. Simultaneous energy recoil detection analysis and Rutherford backscattering spectra show that 100Wdeposition is ideal in terms of polymerized film formation and H content while, lower or higher power induce reduced film retention or excessive cross linking, respectively. Surface composition of the ALL film was further probed by X-ray photoelectron spectroscopy revealing a monocomponent N 1s spectrum compatible with the presence of primary amines. Optimized ALL films were applied to polycaprolactone (PCL) surfaces after Ar plasma activation with implications in the chemistry and wettability of this biocompatible polymer. Human mesenchymal stem cells (hMSCs) were cultured on ALL coated PCL surface and controls. ALL functionalized PCL was found to be especially attractive for the formation of confluent monolayers of hMSCs after 72 h of culture.

PUNZON QUIJORNA Esther;  SÁNCHEZ VAQUERO Vanessa;  MUÑOZ NOVAL Alvaro;  GALLACH PÉREZ D.;  CLIMENT FONT A.;  CECCONE Giacomo;  GAGO R.;  GARCÍA RUIZ Josefa Predestinación;  MANSO SILVAN Miguel; 

2012-12-31

PERGAMON-ELSEVIER SCIENCE LTD

JRC68717

0042-207X,   

https://publications.jrc.ec.europa.eu/repository/handle/JRC68717,   

10.1016/j.vacuum.2010.12.017,