Title: Optimized Allylamine Deposition for Improved Pluripotential Cell Culture
Authors: PUNZON QUIJORNA EstherSÁNCHEZ VAQUERO VanessaMUÑOZ NOVAL AlvaroGALLACH PÉREZ D.CLIMENT FONT A.CECCONE GiacomoGAGO R.GARCÍA RUIZ Josefa PredestinaciónMANSO SILVAN Miguel
Citation: VACUUM vol. 85 no. 12 p. 1071-1075
Publisher: PERGAMON-ELSEVIER SCIENCE LTD
Publication Year: 2011
JRC N°: JRC68717
ISSN: 0042-207X
URI: http://publications.jrc.ec.europa.eu/repository/handle/JRC68717
DOI: 10.1016/j.vacuum.2010.12.017
Type: Articles in periodicals and books
Abstract: Deposition of allylamine (ALL) by plasma enhanced chemical vapor deposition has been optimized on silicon based models. Simultaneous energy recoil detection analysis and Rutherford backscattering spectra show that 100Wdeposition is ideal in terms of polymerized film formation and H content while, lower or higher power induce reduced film retention or excessive cross linking, respectively. Surface composition of the ALL film was further probed by X-ray photoelectron spectroscopy revealing a monocomponent N 1s spectrum compatible with the presence of primary amines. Optimized ALL films were applied to polycaprolactone (PCL) surfaces after Ar plasma activation with implications in the chemistry and wettability of this biocompatible polymer. Human mesenchymal stem cells (hMSCs) were cultured on ALL coated PCL surface and controls. ALL functionalized PCL was found to be especially attractive for the formation of confluent monolayers of hMSCs after 72 h of culture.
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