Characterization of U-based Thin Films - the UFe2+x Case
We have characterized UFe2+x films prepared by sputter deposition onto fused silica (SiO2) and Si(111) substrates with the film thickness ranging from 75 nm to 900 nm. The X-ray diffraction results showed an amorphous character of the deposited material. Some of the films showed in addition a pattern of highly textured cubic Laves phase. Rutherford Backscattering Spectroscopy with 2 MeV He+ ions has been used to determine the composition, thickness and concentration depth profile of the films. A large ageing affect was observed within 1 month after that the films were exposed to air. Magnetic measurements revealed TC increasing with relative Fe concentration and reaching approx. 450 K in UFe3.0.
KIM-NGAN Nhu-T H;
HAVELA L;
ADAMSKA A. M.;
DANIS S.;
PESICKA J;
MACL J;
ELOIRDI Rachel;
HUBER Frank;
GOUDER Thomas;
BALOGH A.G.;
2012-02-07
Institute of Physics (IOP) and IOP Publishing 2010
JRC68742
1742-6588,
http://iopscience.iop.org/1742-6596/303/1/012012,
https://publications.jrc.ec.europa.eu/repository/handle/JRC68742,
10.1088/1742-6596/303/1/012012,
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