Characterization of U-based Thin Films - the UFe2+x Case

We have characterized UFe2+x films prepared by sputter deposition onto fused silica (SiO2) and Si(111) substrates with the film thickness ranging from 75 nm to 900 nm. The X-ray diffraction results showed an amorphous character of the deposited material. Some of the films showed in addition a pattern of highly textured cubic Laves phase. Rutherford Backscattering Spectroscopy with 2 MeV He+ ions has been used to determine the composition, thickness and concentration depth profile of the films. A large ageing affect was observed within 1 month after that the films were exposed to air. Magnetic measurements revealed TC increasing with relative Fe concentration and reaching approx. 450 K in UFe3.0.

KIM-NGAN Nhu-T H;  HAVELA L;  ADAMSKA A. M.;  DANIS S.;  PESICKA J;  MACL J;  ELOIRDI Rachel;  HUBER Frank;  GOUDER Thomas;  BALOGH A.G.; 

2012-02-07

Institute of Physics (IOP) and IOP Publishing 2010

JRC68742

1742-6588,   

http://iopscience.iop.org/1742-6596/303/1/012012,    https://publications.jrc.ec.europa.eu/repository/handle/JRC68742,   

10.1088/1742-6596/303/1/012012,