Title: Amino-rich plasma polymer films prepared by RF magnetron sputtering
Authors: HANUS JANCECCONE GiacomoROSSI Francois
Citation: PLASMA PROCESSES AND POLYMERS vol. 9 no. 4 p. 371-379
Publisher: WILEY-BLACKWELL
Publication Year: 2012
JRC N°: JRC68760
ISSN: 1612-8850
URI: http://onlinelibrary.wiley.com/doi/10.1002/ppap.201100137/abstract;jsessionid=D199651F8D9CECBD642367B705352136.f01t02
http://publications.jrc.ec.europa.eu/repository/handle/JRC68760
DOI: 10.1002/ppap.201100137
Type: Articles in periodicals and books
Abstract: RF magnetronQ2 sputtering of nylon 6.6 followed by N2/H2 plasma post-treatment was used for deposition of nitrogen-rich film with amino functionalities on the surface. The maximal NH2/C concentration obtained was 11% and the NH2/N reached 13.5%. The films are positively charged with an isoelectric point of 4.5. The interaction between the film and the buffer solution was studied and shows that the films are stable in cell culture conditions. A quartz crystal microbalance study showed the ability of the films to adsorb different proteins and their antigens and quantifies the protein adsorbed as a function of the films properties.
JRC Directorate:Institute for Health and Consumer Protection Historical Collection

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