An official website of the European Union How do you know?      
European Commission logo
JRC Publications Repository Menu

The effect of shunt resistance on External Quantum Efficiency measurements at high light bias conditions

cover
Series connection of multi-junction devices can lead to opto-electronic interactions between junctions and thus coupling effects. These effects can be important during External Quantum Efficiency (EQE) measurements of multi-junction devices. In an attempt to find the impact of coupling effects on different shunt resistance devices, EQE measurements have been carried out at high intensity light bias conditions. These measurements showed that in those conditions, the coupling current in high quality materials is considerably higher compared to low quality ones and lead to a larger reduction of the EQE signal. The difference in EQE is, nevertheless, small and it is apparent in all the response region of the material.
2014-11-27
IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
JRC89465
9781479943982,   
2156-3381,   
http://ieeexplore.ieee.org/xpls/abs_all.jsp?arnumber=6924902&tag=1,    https://publications.jrc.ec.europa.eu/repository/handle/JRC89465,   
10.1109/PVSC.2014.6924902,   
Language Citation
NameCountryCityType
Datasets
IDTitlePublic URL
Dataset collections
IDAcronymTitlePublic URL
Scripts / source codes
DescriptionPublic URL
Additional supporting files
File nameDescriptionFile type 
Show metadata record  Copy citation url to clipboard  Download BibTeX
Items published in the JRC Publications Repository are protected by copyright, with all rights reserved, unless otherwise indicated. Additional information: https://ec.europa.eu/info/legal-notice_en#copyright-notice