The exchange bias effect was studied on antiferromagnetic-ferromagnetic UO2/permalloy (Ni80Fe20) thin films. Films with a fixed thickness of UO2 layer and variable thickness of the covering Ni80Fe20 layer have been grown by reactive sputter deposition. The X-ray diffraction study showed epitaxial growth of the UO2 layer on (100) CaF2 substrates and a polycrystalline permalloy layer on top of it. The samples exhibited perpendicular exchange bias with the maximum magnitude of 22 mT found in UO2/Ni80Fe20 with the thinnest permalloy of 177 Å.
TERESHINA Evgenia;
DANIS S.;
SPRINGELL R.;
BAO Zhaohui;
HAVELA L.;
CACIUFFO Roberto;
2015-10-06
ELSEVIER SCIENCE SA
JRC92687
0040-6090,
http://ictf16.com/,
http://www.sciencedirect.com/science/article/pii/S0040609015005489,
https://publications.jrc.ec.europa.eu/repository/handle/JRC92687,
10.1016/j.tsf.2015.05.014,
| Name | Country | City | Type |
|---|
This document is only visible at the Commission level.
You are not authorized to publish or distribute it outside the European Commission.
This is a public document. You can share this publication.
Datasets
| ID | Title | Public URL |
|---|
Dataset collections
| ID | Acronym | Title | Public URL |
|---|
Scripts / source codes
| Description | Public URL |
|---|
Additional supporting files
| File name | Description | File type |
|---|